Enter inventor name

Masahiro Miyagi

USPTO Granted Patents = 20 (Patent Applications = 1)

Average Co-Inventor Count = 2.9

ph-index = 4

Forward Citations = 126(Granted Patents)

Location History:

Shiga, JP (1998 - 1999)
Kyoto, JP (2007 - 2020)

Company Filing History:

15 out of 1,116

Screen Holdings Co., Ltd.

patents

4 out of 1,306

Dainippon Screen Mfg. Co., Ltd.

Dainippon Screen Manufacturing Co., Ltd.

patents

where one patent can have more than one assignee

Years Active: 1998-2020

Loading Chart...

20 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 10761422 - Processing fluid supply device, substrate processing device, processing fluid supply method, substrate processing method, processing fluid processing device, and processing fluid processing method (2020-09-01),

2. 10629459 - Substrate processing apparatus (2020-04-21),

3. 10468273 - Substrate processing method (2019-11-05),

4. 10133173 - Processing fluid supply device, substrate processing device, processing fluid supply method, substrate processing method, processing fluid processing device, and processing fluid processing method (2018-11-20),

5. 9997378 - Substrate processing apparatus and substrate processing method (2018-06-12),

6. 9972515 - Substrate processing apparatus and substrate processing method (2018-05-15),

7. 9852931 - Substrate processing apparatus (2017-12-26),

8. 9713822 - Substrate processing apparatus (2017-07-25),

9. 9640382 - Substrate processing apparatus and substrate processing method (2017-05-02),

10. 9601357 - Substrate processing device and substrate processing method (2017-03-21),

11. 9576808 - Substrate processing apparatus and substrate processing method (2017-02-21),

12. 9396974 - Substrate processing apparatus and substrate processing method (2016-07-19),

13. 9165798 - Substrate processing apparatus and substrate processing method (2015-10-20),

14. 9142433 - Substrate processing apparatus and substrate processing method (2015-09-22),

15. 8883030 - Substrate processing apparatus and substrate processing method (2014-11-11),

Title: **Masahiro Miyagi: An Innovator in Substrate Processing Technologies**

Introduction

Masahiro Miyagi, located in Kyoto, Japan, is a prolific inventor known for his contributions to semiconductor manufacturing equipment and processes. With an impressive portfolio of 20 patents, Miyagi has made significant advancements in the field of substrate processing technologies, particularly focusing on processing fluid systems.

Latest Patents

Among his latest patents are several groundbreaking inventions, including a Processing Fluid Supply Device and a Substrate Processing Device. One notable innovation is a Processing Liquid Supplying Apparatus, designed to effectively discharge processing liquid to a processing object. This apparatus integrates an X-ray irradiating means, which directs X-rays onto the processing liquid via a specialized window member, optimizing the efficiency of the fluid supply. Additionally, he has developed a Substrate Processing Apparatus that minimizes electric discharge during substrate processing by utilizing a cup part formed from electrical insulation material, significantly enhancing the reliability of semiconductor applications.

Career Highlights

Miyagi has had a noteworthy career with key roles at esteemed companies such as Screen Holdings Co., Ltd. and Dainippon Screen Mfg. Co., Ltd. His work with these organizations has emphasized his role as a leader in the innovation of substrate processing technologies.

Collaborations

Throughout his career, Masahiro Miyagi has collaborated with talented individuals, including Toru Endo and Hiroyuki Araki. Their collective expertise has contributed to the development of advanced processing technologies and solidified their contributions to the industry.

Conclusion

In conclusion, Masahiro Miyagi's achievements in the realm of substrate processing and fluid supply technologies underscore his significance as an inventor. His innovative patents not only enhance manufacturing processes but also pave the way for future advancements in semiconductor technology.

This text is generated by artificial intelligence and may not be accurate.

Please report any incorrect information to support@idiyas.com