Naoshige Itami

Title: Naoshige Itami: Innovator in Substrate Cleaning Technology

Introduction

Naoshige Itami is a notable inventor based in Kanagawa, Japan. He is recognized for his contributions to the field of substrate cleaning technology. His innovative approach has led to the development of a unique rinsing apparatus that enhances cleaning efficiency.

Latest Patents

Naoshige Itami holds 1 patent for his invention titled "Apparatus for and method of cleaning substrate." This patent describes a substrate rinsing apparatus of a non-contact type that boasts a high rinsing ability. The apparatus features both an ultrasonic rinsing nozzle and a high-pressure rinsing nozzle within the same system. The ultrasonic rinsing nozzle ejects ultrasonic rinsing liquid as a curtain through a slit, while the high-pressure rinsing nozzle directs a high-pressure rinsing jet toward the ultrasonic rinsing liquid. This dual-action mechanism effectively removes foreign matter from the substrate, ensuring a thorough cleaning process.

Career Highlights

Throughout his career, Naoshige Itami has worked with prominent companies such as Dainippon Screen Mfg. Co., Ltd. and Fujitsu Corporation. His experience in these organizations has contributed significantly to his expertise in substrate cleaning technologies.

Collaborations

Naoshige Itami has collaborated with notable colleagues, including Mitsuaki Yoshitani and Kazuo Kinose. Their combined efforts have further advanced the field of substrate cleaning.

Conclusion

Naoshige Itami's innovative contributions to substrate cleaning technology demonstrate his commitment to enhancing industrial processes. His patent reflects a significant advancement in cleaning efficiency, showcasing the importance of innovation in this field.