Takamatsu, Japan

Mitsuaki Kameyama

This inventor holds 1 USPTO granted patent. Top assignee: Futec Inc.. Active years: 2003.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Mitsuaki Kameyama. Retrieved from https://idiyas.com/inventor/mitsuaki-kameyama

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2003

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1 patent (USPTO):Explore Patents

Title: Mitsuaki Kameyama: Innovator in Thickness Measurement Technology.

Introduction

Mitsuaki Kameyama is a notable inventor based in Takamatsu, Japan. He has made significant contributions to the field of measurement technology, particularly with his innovative thickness-measuring device. His work exemplifies the intersection of engineering and practical application in industrial settings.

Latest Patents

Kameyama holds a patent for a thickness-measuring device. This device comprises an X-ray tube unit that includes an X-ray tube, and an X-ray detector unit featuring an X-ray detector with a sensor. The device is designed to measure the thickness of objects by driving the X-ray tube unit and the X-ray detector unit back and forth in synchronism with each other. A mask is strategically placed above the sensor of the X-ray detector to partially cover it, which effectively reduces the measuring area per unit time.

Career Highlights

Kameyama is associated with Futec Inc., where he continues to develop and refine measurement technologies. His innovative approach has led to advancements in the efficiency and accuracy of thickness measurement, which is crucial in various industrial applications.

Collaborations

Kameyama has worked alongside notable colleagues such as Kiyoshi Mizobuchi and Yoshinori Kurokawa. Their collaborative efforts have contributed to the development of cutting-edge technologies in their field.

Conclusion

Mitsuaki Kameyama's contributions to thickness measurement technology highlight his role as an influential inventor. His patented device showcases the potential for innovation in industrial measurement techniques.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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