Schweinfurt, Germany

Mirko Buechsenschuetz

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Carl Zeiss Smt Gmbh. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Mirko Buechsenschuetz. Retrieved from https://idiyas.com/inventor/mirko-buechsenschuetz

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2025

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Mirko Buechsenschuetz: Innovator in Semiconductor Lithography

Introduction

Mirko Buechsenschuetz is a notable inventor based in Schweinfurt, Germany. He has made significant contributions to the field of semiconductor lithography, particularly through his innovative patent. His work is essential in advancing technology in this critical area.

Latest Patents

Mirko Buechsenschuetz holds a patent for a projection exposure apparatus designed for semiconductor lithography. This apparatus includes an optical element that consists of a main body and an actuator. The actuator is responsible for deforming an optically effective surface formed on the main body. Notably, the actuator is situated in a recess on the rear side of the main body, showcasing a unique design that enhances functionality.

Career Highlights

Mirko is currently employed at Carl Zeiss SMT GmbH, a leading company in optical systems and semiconductor manufacturing technology. His role at the company allows him to apply his expertise and contribute to groundbreaking advancements in the industry.

Collaborations

Some of his coworkers include Markus Raab and Andreas Raba, who collaborate with him on various projects within the company. Their teamwork fosters an environment of innovation and creativity.

Conclusion

Mirko Buechsenschuetz is a distinguished inventor whose work in semiconductor lithography is paving the way for future technological advancements. His contributions are invaluable to the field and highlight the importance of innovation in driving progress.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…