Sendai, Japan

Minoru Matsuda

This inventor holds 2 USPTO granted patents. Top assignee: Chisso Corporation. Active years: 1989-1990.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Minoru Matsuda. Retrieved from https://idiyas.com/inventor/minoru-matsuda-pgzzd6p4

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 1.5

ph-index = 1

Forward Citations = 8(Granted Patents)


Location History:

  • Izumishi, JP (1989)
  • Sendaishi, JP (1990)

Company Filing History:


Years Active: 1989-1990

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2 patents (USPTO):Explore Patents

Title: Minoru Matsuda: Innovator in Copolymer Technology

Introduction

Minoru Matsuda is a distinguished inventor based in Sendai-shi, Japan. He has made significant contributions to the field of polymer chemistry, particularly in the development of novel copolymers. His work has led to advancements in materials that are essential for various applications, including resist materials used in semiconductor manufacturing.

Latest Patents

Matsuda holds 2 patents that showcase his innovative approach to copolymer technology. One of his latest patents involves a copolymer derived from sulfur dioxide and a vinyl compound. This copolymer serves as an active ingredient for a positive type resist material that can be decomposed by electron beam or X-rays. It exhibits high sensitivity and superior resistance to dry etching. The copolymer consists of 1 to 50% by mol of specific structural units and 50 to 99% by mol of one or more vinyl compounds, including aromatic ring-containing vinyl compounds, with a number average molecular weight ranging from 500 to 500,000.

Another notable patent by Matsuda is a copolymer of sulfur dioxide and polyalkylpolysilylstyrene. This copolymer is composed of repeating units where R represents a lower alkyl group, and it has a number-average molecular weight between 2,000 and 2,000,000. This innovative material is recognized for its high sensitivity to light, electron-beam, or X-ray radiation, along with excellent dry etching resistance.

Career Highlights

Matsuda is currently associated with Chisso Corporation, where he continues to push the boundaries of polymer research. His work has not only contributed to the advancement of materials science but has also positioned him as a key figure in the industry.

Collaborations

Throughout his career, Matsuda has collaborated with notable colleagues, including Seiki Itoh and Hiroshi Ono. These collaborations have further enriched his research and development efforts, leading to impactful innovations in the field.

Conclusion

Minoru Matsuda's contributions to copolymer technology have established him as a prominent inventor in his field. His patents reflect a commitment to innovation and excellence, paving the way for future advancements in materials science.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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