The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 23, 1990
Filed:
Jan. 17, 1989
Minoru Matsuda, Sendaishi, JP;
Chisso Corporation, Osaka, JP;
Abstract
A novel copolymer useful as an active ingredient for a positive type resist material to be decomposed by electron beam or X-rays with a high sensitivity and having a superior resistance to dry etching, a process for producing the copolymer and a resist material containing the copolymer are provided, which copolymer consists of 1 to 50% by mol of structural units of ##STR1## and 50 to 99% by mol of structural units of one or more vinyl compounds at least one of which is an aromatic ring-containing vinyl compound and having a number average molecular weight of 500 to 500,000.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile