The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 19, 1989
Filed:
Jul. 22, 1988
Applicant:
Inventors:
Assignee:
Chisso Corporation, Osaka, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F / ;
U.S. Cl.
CPC ...
526279 ; 525536 ; 528 24 ; 528 32 ; 528385 ;
Abstract
A copolymer of sulfur dioxide and polyalkylpolysilylstyrene composed of repeating units of formula I: ##STR1## where R is a lower alkyl group, p is an integer between 2 and 5, q in an integer between 1 and 10 representing the sequence length of polyalkylpolysilylstyrene, and n is a number between 5 and 10,000, and having a number-average molecular weight of 2,000 to 2,000,000. This copolymer is a novel and useful positive resist material which is highly sensitive to light, or electron-beam or X-ray radiation and is of high dry etching resistance.
Matsuda, Minoru. (1989). Copolymer of sulfur dioxide and polyalkylpolysilylstyrene (U.S. Patent No. 4888392). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4888392
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile