Kawasaki, Japan

Minoru Adegawa

USPTO Granted Patents = 1 

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Minoru Adegawa: Innovator in Resist Composition Technology

Introduction

Minoru Adegawa is a notable inventor based in Kawasaki, Japan. He has made significant contributions to the field of resist composition technology, which is crucial in the manufacturing of semiconductors and microelectronics. His innovative work has led to the development of a unique resist composition that enhances the efficiency of pattern formation.

Latest Patents

Adegawa holds 1 patent for his invention titled "Resist composition and method of forming resist pattern." This patent describes a resist composition that generates an acid upon exposure, with its solubility in a developing solution changing due to the action of the acid. The composition includes high-molecular-weight compounds with specific constitutional units, which are essential for its functionality.

Career Highlights

Minoru Adegawa is associated with Tokyo Ohka Kogyo Co., Ltd., a company known for its advancements in chemical products for the electronics industry. His work has been instrumental in pushing the boundaries of resist technology, making significant impacts on the efficiency and effectiveness of semiconductor manufacturing processes.

Collaborations

Adegawa has collaborated with notable colleagues such as Takaaki Kaiho and Yasuo Someya. Their combined expertise has contributed to the successful development of innovative solutions in the field of resist compositions.

Conclusion

Minoru Adegawa's contributions to resist composition technology exemplify the importance of innovation in the semiconductor industry. His work continues to influence advancements in microelectronics, showcasing the vital role of inventors in shaping technology.

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