The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 07, 2024
Filed:
Dec. 02, 2020
Tokyo Ohka Kogyo Co., Ltd., Kawasaki, JP;
TOKYO OHKA KOGYO CO., LTD., Kawasaki, JP;
Abstract
A resist composition which generates an acid by exposure and whose solubility in a developing solution changes by the action of an acid. The resist composition contains a high-molecular-weight compound having a constitutional unit represented by General Formula (a0-1), and a high-molecular-weight compound having a constitutional unit represented by General Formula (f01-1) and a constitutional unit including an acid-dissociable group represented by General Formula (f02-r-1). In the formulas, R represents a hydrogen atom or the like; Varepresents a divalent linking group; nrepresents an integer of 0 to 2; Rais a lactone-containing cyclic group having a cyano group or the like; Vfrepresents a divalent linking group; Rfand Rfeach represents a trifluoromethyl group or the like; Rfand Rfeach represents an alkyl group having 1 to 3 carbon atoms; and Rfrepresents a polycyclic aliphatic hydrocarbon group