Ming-Tsung Hsu

Title: Innovations of Ming-Tsung Hsu in Semiconductor Technology

Introduction

Ming-Tsung Hsu is a notable inventor based in Chiayi County, Taiwan. He has made significant contributions to the field of semiconductor technology, holding two patents that showcase his innovative approach to device manufacturing.

Latest Patents

Hsu's latest patents include a semiconductor device and a method of manufacturing the same. The semiconductor device comprises a substrate, an isolation structure, a barrier structure, a first conductive layer, a second conductive layer, a first gate dielectric layer, and a second gate dielectric layer. The substrate is divided into a first region and a second region, with the barrier structure positioned on the isolation structure. The first conductive layer is situated on the first region, while the second conductive layer is located on the second region. The first and second gate dielectric layers are separated by the isolation structure, enhancing the device's functionality.

Another patent focuses on the manufacturing method of a semiconductor device, which involves forming multiple flash memory structures on a semiconductor substrate. Each flash memory structure includes a floating gate and a control gate. The method also details the formation of a pseudo contact, a liner film, and an interlayer dielectric layer, culminating in the creation of a contact opening filled with conductive material.

Career Highlights

Ming-Tsung Hsu is currently employed at Powerchip Semiconductor Manufacturing Corporation, where he continues to advance semiconductor technology. His work has been instrumental in developing innovative solutions that enhance the performance and efficiency of semiconductor devices.

Collaborations

Hsu collaborates with esteemed colleagues such as Hung-Kwei Liao and Chen-Chiang Liu, contributing to a dynamic research environment that fosters innovation.

Conclusion

Ming-Tsung Hsu's contributions to semiconductor technology through his patents and collaborative efforts highlight his role as a key innovator in the field. His work continues to influence advancements in semiconductor manufacturing processes.