logo

For the Inventor, By the Inventor

Hsinchu, Taiwan

Ming-Tao Ho

This inventor holds 6 USPTO granted patents. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2004-2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ming-Tao Ho. Retrieved from https://idiyas.com/inventor/ming-tao-ho

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 6

% Patents Active = 33.3

Average Co-Inventor Count = 3.3

ph-index = 2

Forward Citations = 11(Granted Patents)


Company Filing History:

goldMedal6 out of 42,926 
 
Taiwan Semiconductor Manufacturing Comp. Ltd.
 patents

Years Active: 2004-2014

Loading Chart...
6 patents (USPTO):Explore Patents
1. 8724088 - Pellicle mounting apparatus and assembly with pellicle mounted on mask (2014-05-13),
2. 8563227 - Method and system for exposure of a phase shift mask (2013-10-22),
3. 8288081 - Method and system for exposure of a phase shift mask (2012-10-16),
4. 8268514 - Pellicle mounting method and apparatus (2012-09-18),
5. 7387855 - Anti-ESD photomask blank (2008-06-17),
6. 6765645 - De-pellicle tool (2004-07-20),

Title: The Innovations of Ming-Tao Ho

Introduction

Ming-Tao Ho is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, holding a total of 6 patents. His work focuses on advanced technologies that enhance the efficiency and effectiveness of photomask applications.

Latest Patents

Ming-Tao Ho's latest patents include a "Pellicle mounting apparatus and assembly with pellicle mounted on mask." This innovative apparatus is designed for mounting a pellicle to a photomask, utilizing a chamber that can be filled with extreme clean dry air (XCDA) or an inert gas. The process involves irradiating the mask with vacuum ultra violet (VUV) light while the pellicle is mounted in a controlled atmosphere. Another notable patent is the "Method and system for exposure of a phase shift mask." This method outlines a comprehensive approach to creating a mask, involving multiple layers and exposures to achieve precise etching and imaging.

Career Highlights

Ming-Tao Ho is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leader in the semiconductor industry. His work has been instrumental in developing technologies that push the boundaries of photomask applications. His innovative spirit and technical expertise have earned him recognition in the field.

Collaborations

Ming-Tao Ho has collaborated with notable colleagues, including Jiin-Hong Lin and Chih-Chen Chen. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Ming-Tao Ho's contributions to the semiconductor industry through his patents and collaborative efforts highlight his role as a key innovator. His work continues to influence advancements in photomask technology, showcasing the importance of innovation in this critical field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…