The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 17, 2008
Filed:
Jan. 10, 2005
Eric Chiang, Miao-Li, TW;
Hung-chun Wang, Ching-shuei, TW;
Min-chih Hsieh, Hsin-Chu County, TW;
Ming-tao Ho, Hsin-Chu, TW;
Eric Chiang, Miao-Li, TW;
Hung-Chun Wang, Ching-shuei, TW;
Min-Chih Hsieh, Hsin-Chu County, TW;
Ming-Tao Ho, Hsin-Chu, TW;
Abstract
An anti-electrostatic discharge photomask blank for fabrication of an anti-electrostatic discharge photomask is disclosed. The anti-electrostatic discharge photomask blank includes a mask substrate, a conductive layer provided on the mask substrate and an opaque patterning layer provided on the conductive layer. The conductive layer prevents charges of opposite polarity from accumulating on a photomask fabricated from the photomask blank, thus preventing electrostatic discharges on the photomask.