This inventor holds 1 USPTO granted patent. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2008.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2008
Title: Min-Chih Hsieh: Inventor of an Anti-ESD Photomask Blank.
Introduction
Min-Chih Hsieh is an inventor associated with Hsinchu, Taiwan, and Taiwan Semiconductor Manufacturing Company Limited. His patent work addresses electrostatic discharge protection in photomask technology.
Latest Patents
Hsieh is credited with 1 patent, titled “Anti-ESD Photomask Blank.” The invention describes a photomask blank comprising a mask substrate, a conductive layer, and an opaque patterning layer. The conductive layer helps prevent charges of opposite polarity from accumulating on a photomask made from the blank, reducing the risk of electrostatic discharge.
Career Highlights
Hsieh’s listed patent reflects work on a materials and fabrication approach intended to protect photomasks from electrostatic discharge. He is associated with Taiwan Semiconductor Manufacturing Company Limited.
Collaborations
Hsieh’s listed coworkers include Eric Chiang and Ming-Tao Ho.
Conclusion
Min-Chih Hsieh’s patent focuses on using a conductive layer to reduce electrostatic discharge risks in photomasks, contributing to the development of protective semiconductor manufacturing technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile