Ming Rong Chang

Title: The Innovations of Ming Rong Chang

Introduction

Ming Rong Chang is a notable inventor based in Taipei, Taiwan. He has made significant contributions to the field of integrated circuit manufacturing. With a total of 2 patents, his work has advanced the technology used in semiconductor materials.

Latest Patents

Chang's latest patents focus on the manufacturing methods of integrated circuits. One of his key innovations involves a method for creating a first charge type buried layer in a semiconductor material. This process includes implanting first charge type dopants through a sacrificial oxide, which protects the semiconductor crystalline lattice from damage. The absence of the sacrificial oxide would typically result in damage to the lattice, but Chang's method successfully prevents this issue. Additionally, a pre-anneal oxide is grown and subsequently removed as part of the process.

Career Highlights

Ming Rong Chang is currently employed at Macronix International Co., Ltd. His work at this company has allowed him to explore and develop advanced technologies in the semiconductor industry. His contributions have been instrumental in enhancing the efficiency and reliability of integrated circuits.

Collaborations

Chang has collaborated with several talented individuals in his field, including Shih-Chin Lien and Yin-Fu Huang. These partnerships have fostered innovation and have led to the successful development of new technologies.

Conclusion

Ming Rong Chang's work in integrated circuit manufacturing showcases his dedication to innovation and technology. His patents reflect a deep understanding of semiconductor materials and their applications. Through his career, he continues to make impactful contributions to the field.