This inventor holds 1 USPTO granted patent. Top assignee: United Microelectronics Corp.. Active years: 2003.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2003
Title: The Innovations of Ming-Hui Wu
Introduction
Ming-Hui Wu is a notable inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor technology. His innovative approach has led to the development of a unique method that addresses critical challenges in gate length bias.
Latest Patents
Ming-Hui Wu holds a patent titled "Method for reducing gate length bias." This patent discloses a method that utilizes an additional blanket ion implantation process to adjust the etching property of the undoped conductive layer. The invention effectively reduces the gate length bias between NMOS and PMOS gate electrodes by employing a polysilicon layer to form these electrodes.
Career Highlights
Ming-Hui Wu is currently associated with United Microelectronics Corporation, a leading company in the semiconductor industry. His work at this organization has allowed him to focus on advancing technologies that enhance the performance and reliability of semiconductor devices.
Collaborations
Ming-Hui Wu has collaborated with talented coworkers such as Kai-Jen Ko and Yuan-Li Tsai. Their combined expertise has contributed to the successful development of innovative solutions in their field.
Conclusion
Ming-Hui Wu's contributions to semiconductor technology, particularly through his patent on reducing gate length bias, highlight his role as an influential inventor. His work continues to impact the industry positively.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile