Taipei, Taiwan

Ming-Hsiang Hung


Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2018

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1 patent (USPTO):Explore Patents

Title: Innovations by Ming-Hsiang Hung: A Focus on Coaters and Surface Treatment

Introduction: Ming-Hsiang Hung is an accomplished inventor based in New Taipei, Taiwan. With a strong focus on semiconductor technology, he has contributed significantly to the field through his innovative inventions. His patent portfolio includes a noteworthy invention that enhances manufacturing processes within the semiconductor industry.

Latest Patents: Ming-Hsiang Hung holds a patent for a "Coater and Surface Treatment Method." This innovative coater consists of several key components, including a chuck, a source of coating material, a dispensing head, an exhaust system, and a liner. The chuck effectively supports a wafer, while the dispensing head is designed to apply the coating material onto the wafer. The exhaust system efficiently removes any excess coating material, ensuring a clean application. Significantly, the liner, which is partially situated on the inner surface of the exhaust system, possesses a stick resistance to the coating material that surpasses that of the exhaust system's inner surface. This inventive approach improves the precision and effectiveness of surface treatments in semiconductor manufacturing.

Career Highlights: Ming-Hsiang Hung is currently employed by Taiwan Semiconductor Manufacturing Company Limited, a leader in the semiconductor manufacturing industry. His work at this prestigious company underscores his expertise and commitment to advancing technology in this rapidly evolving field.

Collaborations: Throughout his career, Ming-Hsiang has had the opportunity to collaborate with talented individuals such as Teng-Yi Huang and Fu-Jen Tien. These collaborations have likely contributed to the enrichment of his innovative ideas and the development of effective solutions in semiconductor technology.

Conclusion: Ming-Hsiang Hung's contributions to the field of semiconductor manufacturing exemplify innovation and expertise. His patent for a coater and surface treatment method reflects his drive to improve efficiency and precision in manufacturing processes. As he continues to work alongside industry colleagues, his future inventions are eagerly anticipated, promising further advancements in technology.

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