Taiwan Semiconductor Manufacturing Comp. Ltd.

Ming-Hsiang Hung

Cheng-Ming Wu

Li-Jen Wu

Fu-Jen Tien

Teng-Hwee Ng

Teng-Yi Huang

Ming-Yang Chuang

A coater includes a chuck, a source of a coating material, a dispensing head, an exhaust system, and a liner. The chuck is configured to support a wafer. The dispensing head is configured to dispense the coating material onto the wafer. The exhaust system is configured to exhaust the excess coating material. The liner is present at least partially on an inner surface of the exhaust system. The liner has a stick resistance to the coating material, and the stick resistance of the liner is greater than a stick resistance of the inner surface of the exhaust system.

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Taipei, Taiwan

Ming-Hsiang Hung