Tonfene, Taiwan

Ming Da Cheng

This inventor holds 1 USPTO granted patent. Top assignee: Macronix International Co., Ltd.. Active years: 2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ming Da Cheng. Retrieved from https://idiyas.com/inventor/ming-da-cheng-5tl4yw10

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2014

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Ming Da Cheng

Introduction

Ming Da Cheng is a notable inventor based in Tonfene, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the fabrication of conductive lines. His innovative methods have the potential to enhance the efficiency and performance of semiconductor devices.

Latest Patents

Ming Da Cheng holds a patent for a "Method for fabricating conductive lines of a semiconductor device." This patent describes a process that includes depositing a conductive material over a substrate, followed by the application of a first barrier layer on the conductive layer. The method also involves patterning a mask on the first barrier layer, which outlines the layout of the conductive lines. Furthermore, the process includes etching the conductive material and the first barrier layer using the patterned mask to create the conductive lines. A low-temperature post-flow may be performed on the structure, and a dielectric material is deposited over and between the patterned conductive lines. This innovative approach is crucial for advancing semiconductor manufacturing techniques.

Career Highlights

Ming Da Cheng is associated with Macronix International Co., Ltd., where he has been instrumental in developing cutting-edge semiconductor technologies. His work has contributed to the company's reputation as a leader in the semiconductor industry. With a focus on innovation, he continues to push the boundaries of what is possible in semiconductor fabrication.

Collaborations

Ming Da Cheng has collaborated with talented individuals such as Kuang-Chao Chen and Tuung Luoh. These collaborations have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.

Conclusion

Ming Da Cheng's contributions to semiconductor technology through his innovative patent and collaborative efforts highlight his importance in the field. His work continues to influence the future of semiconductor manufacturing, making him a key figure in this industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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