This inventor holds 2 USPTO granted patents. Top assignee: Cabot Microelectronics Corporation. Active years: 2017.
Company Filing History:
Years Active: 2017
Title: Innovations of Ming-Chih Yeh
Introduction
Ming-Chih Yeh is a notable inventor based in Taipei County, Taiwan. He has made significant contributions to the field of chemical-mechanical polishing (CMP) with a focus on silicon nitride and titanium nitride removal. With a total of 2 patents, his work has advanced the technology used in semiconductor manufacturing.
Latest Patents
Ming-Chih Yeh's latest patents include a CMP composition for silicon nitride removal. This invention provides a chemical-mechanical polishing composition that comprises colloidal silica particles modified with metal ions, an anionic surfactant, a buffering agent, and water. The polishing composition is designed to be effective while maintaining a pH of about 2 to about 7, and it is substantially free of oxidizing agents. Additionally, he has developed a CMP method for the suppression of titanium nitride and titanium/titanium nitride removal. This method involves abrading a metal layer with an acidic CMP composition to expose the underlying TiN or Ti/TiN layer, utilizing a surfactant inhibitor to control the polishing rate.
Career Highlights
Ming-Chih Yeh is currently employed at Cabot Microelectronics Corporation, where he continues to innovate in the field of CMP technologies. His work has been instrumental in enhancing the efficiency and effectiveness of semiconductor processing.
Collaborations
Ming-Chih Yeh has collaborated with notable coworkers such as Chih-Pin Tsai and Hui-Fang Hou, contributing to advancements in their shared field of expertise.
Conclusion
Ming-Chih Yeh's contributions to the field of chemical-mechanical polishing have established him as a key inventor in semiconductor technology. His innovative patents reflect his commitment to improving manufacturing processes in the industry.