Company Filing History:
Years Active: 1997-1999
Title: Innovations of Ming-Chih Chung in Semiconductor Technology
Introduction
Ming-Chih Chung is a prominent inventor based in Hsin-Chu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 5 patents. His work focuses on improving semiconductor device structures and processes, which are crucial for the advancement of integrated circuits.
Latest Patents
Chung's latest patents include the "Tungsten tunnel-free process," which describes an improved method for forming tunnel-free tungsten plugs. This process involves depositing an insulating layer of borophospho-tetraethoxysilane (BP-TEOS) over semiconductor device structures. The method includes etching contact openings through the insulating layer and filling them with tungsten, resulting in the fabrication of integrated circuit devices without the complications of tunnel formation. Another notable patent is the "Stepped edge structure of an EEPROM tunneling window." This invention provides a method for forming a stepped trench oxide structure that compensates for oxide thinning effects, thereby enhancing the reliability of semiconductor memory devices.
Career Highlights
Ming-Chih Chung is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His innovative approaches and patented technologies have contributed to the company's reputation for excellence in semiconductor manufacturing.
Collaborations
Chung has collaborated with notable colleagues, including Kuen-Joung Chuang and Jyh-Feng Lin. These partnerships have fostered a collaborative environment that encourages innovation and the development of cutting-edge technologies in the semiconductor field.
Conclusion
Ming-Chih Chung's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence the development of advanced semiconductor devices, ensuring progress in this critical field.