Ming-Chieh Yeh

Title: Innovations by Inventor Ming-Chieh Yeh

Introduction

Ming-Chieh Yeh is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of microelectronics, particularly in etching technologies. With a total of 2 patents, his work focuses on improving processes that enhance the efficiency and quality of semiconductor manufacturing.

Latest Patents

Ming-Chieh Yeh's latest patents include a method of controlling and improving SOG etchback etcher. This innovative method aims to enhance particle levels, stability of etch rates, and etch uniformity by utilizing a dry plasma clean to eliminate polymer buildup from the upper electrode and walls of an etch chamber after spin-on-glass etchback. The etching chamber is designed with a lower electrode, upper electrode, and interior walls, where spin-on-glass etchback occurs, leading to polymer buildup on the chamber surfaces. A dummy wafer is introduced into the chamber, and the polymer buildup is effectively removed using a dry plasma cleaning process.

Another significant patent is the plasma etch method for forming metal-fluoropolymer residue-free vias. This method involves a plasma reactor chamber where a microelectronics fabrication is fixed. The fabrication includes a substrate, a metal layer over the substrate, a silicon-containing dielectric layer on the metal layer, and a patterned photoresist layer on the dielectric layer. The etching process employs a plasma etch method at a specific chamber pressure, using the patterned photoresist layer as a mask to create a patterned silicon-containing dielectric layer. The method ensures that a metal-fluoropolymer residue layer does not form on the etched metal layer by adjusting the chamber pressure during the process.

Career Highlights

Ming-Chieh Yeh is currently employed at Taiwan Semiconductor Manufacturing Company Ltd., a leading firm in the semiconductor industry. His work has been instrumental in advancing etching technologies that are crucial for microelectronics fabrication.

Collaborations

Ming-Chieh has collaborated with notable colleagues, including Fang-Cheng Chen and Po-Tao Chu, contributing to various innovative projects within the semiconductor field.

Conclusion

Ming-Chieh Yeh's contributions to the field of microelectronics through his patents and work at Taiwan Semiconductor Manufacturing Company Ltd. highlight his role as a key innovator in semiconductor technology. His advancements in etching processes continue to influence