Daejeon, South Korea

Min-Suk Cha

This inventor holds 3 USPTO granted patents and 7 EPO patents. Top assignee: Korea Institute of Machinery & Materials. Active years: 2012-2014.


% Patents Active = 66.7

 

Average Co-Inventor Count = 5.3

ph-index = 1

Forward Citations = 8(Granted Patents)


Company Filing History:


Years Active: 2012-2014

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3 patents (USPTO):Explore Patents

Title: Min-Suk Cha: Innovator in Plasma Technology

Introduction

Min-Suk Cha is a prominent inventor based in Daejeon, South Korea. He has made significant contributions to the field of plasma technology, particularly in the development of systems for abating hazardous materials. With a total of 3 patents to his name, Cha's work is instrumental in advancing environmental safety in industrial processes.

Latest Patents

Cha's latest patents include a plasma reactor designed for abating hazardous materials generated during the manufacturing of displays and semiconductors. This innovative reactor features a first and second ground electrode, a dielectric, and a driving electrode connected to an AC power supply. The design aims to enhance the efficiency of hazardous material abatement in low-pressure processes.

Another notable patent is the plasma scrubber, which creates a high-temperature atmosphere to effectively decompose non-biodegradable gases while reducing power consumption. This scrubber consists of multiple reactors that work in tandem to generate plasma and increase the reactivity of the gases, thereby improving the overall efficiency of the decomposition process.

Career Highlights

Min-Suk Cha is affiliated with the Korea Institute of Machinery and Materials, where he continues to push the boundaries of plasma technology. His research focuses on developing innovative solutions that address environmental challenges in industrial applications.

Collaborations

Cha collaborates with esteemed colleagues, including Jae-Ok Lee and Kwan-Tae Kim, who contribute to his research endeavors. Their combined expertise fosters a dynamic research environment that enhances the development of cutting-edge technologies.

Conclusion

Min-Suk Cha's contributions to plasma technology exemplify the importance of innovation in addressing environmental issues. His patents reflect a commitment to creating safer industrial processes, making him a key figure in the field.

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