The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 07, 2014
Filed:
Oct. 15, 2010
Min Hur, Daejeon, KR;
Min-suk Cha, Daejeon, KR;
Young-hoon Song, Daejeon, KR;
Jae-ok Lee, Daejeon, KR;
Dae-hoon Lee, Daejeon, KR;
Kwan-tae Kim, Daegeon, KR;
Min Hur, Daejeon, KR;
Min-Suk Cha, Daejeon, KR;
Young-Hoon Song, Daejeon, KR;
Jae-Ok Lee, Daejeon, KR;
Dae-Hoon Lee, Daejeon, KR;
Kwan-Tae Kim, Daegeon, KR;
Korea Institute of Machinery & Materials, Daejeon, KR;
Abstract
The present invention provides a plasma reactor for abating hazardous materials generated in a low-pressure process during a process of manufacturing a display or a semiconductor. A plasma reactor for abating hazardous materials according to an exemplary embodiment of the present invention includes: a first ground electrode and a second ground electrode disposed at a distance from each other; a dielectric fixed between the first ground electrode and the second ground electrode; and at least one driving electrode disposed on an outer surface of the dielectric, being spaced apart from the first ground electrode and the second ground electrode and connected to an AC power supply unit to receive a driving voltage therefrom.