Min Da Hu

Title: Min Da Hu: Innovator in Semiconductor Technology

Introduction

Min Da Hu is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of semiconductor technology, holding three patents that showcase his innovative approaches to etching methods and power charging systems.

Latest Patents

One of his latest patents is an etching method and fabrication method of semiconductor structures. This method involves forming trenches in a to-be-etched structure and creating a dielectric layer within those trenches. The etching process is carefully controlled, particularly the etching temperature, while a polymer is formed on the side surface of the structure. The process includes both a deposition stage and a removal stage for the polymer, ensuring effective etching of the dielectric layer.

Another notable patent is a system and method for power charging or discharging. This system consists of multiple stacks and converters, where each converter is designed to charge a corresponding stack for ion adsorption in a liquid. The converters operate in different modes depending on the charging state of the stacks, allowing for efficient voltage conversion.

Career Highlights

Min Da Hu has worked with several esteemed companies, including General Electric Company and Semiconductor Manufacturing International Corporation. His experience in these organizations has contributed to his expertise in semiconductor technologies and innovations.

Collaborations

Throughout his career, Min Da Hu has collaborated with notable colleagues such as Hai Yang and Yunfeng Liu. These partnerships have further enhanced his work and contributions to the field.

Conclusion

Min Da Hu is a distinguished inventor whose work in semiconductor technology has led to significant advancements. His patents reflect his innovative spirit and dedication to improving the efficiency of semiconductor processes.