Min-Chiang Chuang

Title: Min-Chiang Chuang: Innovator in Semiconductor Technology

Introduction

Min-Chiang Chuang is a notable inventor based in Taoyuan, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative methods for manufacturing semiconductor devices. His work has implications for the efficiency and performance of electronic components.

Latest Patents

Min-Chiang Chuang holds a patent for a semiconductor device and its manufacturing method. This patent outlines a method that includes forming a first transistor over a substrate, which comprises a first source/drain feature. The process involves depositing an interlayer dielectric layer around the first transistor, etching an opening in the dielectric layer to expose the first source/drain feature, and conformably depositing a semimetal layer over the dielectric layer. The semimetal layer has a portion in the opening and another portion over the top surface of the dielectric layer. Finally, a source/drain contact is formed in the opening in the interlayer dielectric layer.

Career Highlights

Min-Chiang Chuang is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at this company has allowed him to collaborate with other talented professionals in the field, enhancing the development of advanced semiconductor technologies.

Collaborations

Some of his notable coworkers include Kuan-Kan Hu and Jhih-Rong Huang. Their collaborative efforts contribute to the innovative environment at Taiwan Semiconductor Manufacturing Company Limited.

Conclusion

Min-Chiang Chuang's contributions to semiconductor technology through his patent and work at Taiwan Semiconductor Manufacturing Company Limited highlight his role as an influential inventor in the industry. His innovative methods continue to shape the future of semiconductor manufacturing.