This inventor holds 3 USPTO granted patents and 3 published patent applications. Top assignee: Lam Research Ag. Active years: 2017-2019.
Company Filing History:
Years Active: 2017-2019
Title: Milan Pliska: Innovator in Substrate Treatment Technologies
Introduction
Milan Pliska is a notable inventor based in Villach, Austria. He has made significant contributions to the field of substrate treatment technologies, holding a total of 3 patents. His work focuses on innovative methods to enhance the performance and efficiency of wafer-shaped articles.
Latest Patents
One of Milan's latest patents is titled "Reduction of surface and embedded substrate charge by controlled exposure to vacuum ultraviolet (VUV) light in low-oxygen environment." This invention involves a system designed to reduce surface and embedded charge in a substrate using a vacuum ultraviolet (VUV) assembly. The assembly includes a housing and a VUV lamp that generates and directs ultraviolet (UV) light at the substrate. A movement device is incorporated to facilitate the movement of either the VUV assembly or the substrate support during exposure, ensuring effective charge reduction.
Another significant patent is the "Apparatus for liquid treatment of wafer shaped articles." This apparatus features a spin chuck that holds a wafer-shaped article at a specific distance from its upper surface. A treatment assembly is mounted above the spin chuck, extending parallel to its surface. The design allows for effective treatment of the wafer while maintaining its position securely with upwardly projecting gripping pins.
Career Highlights
Milan Pliska is currently employed at Lam Research AG, a company renowned for its advanced semiconductor manufacturing equipment. His role involves developing innovative solutions that enhance the efficiency of wafer processing technologies.
Collaborations
Milan has collaborated with several professionals in his field, including Reinhold Schwarzenbacher and Bridget Hill. These collaborations have contributed to the advancement of technologies in substrate treatment.
Conclusion
Milan Pliska's innovative work in substrate treatment technologies has positioned him as a key figure in the industry. His patents reflect a commitment to enhancing the efficiency and effectiveness of wafer processing, making significant strides in the field.