Mikk Lippmaa

Title: Mikk Lippmaa: Innovator in Vacuum Processing Technology

Introduction: Mikk Lippmaa is a noted inventor based in Tokyo, Japan, recognized for his contribution to vacuum processing technology. With a focus on enhancing vapor-deposition processes, he holds a patent that showcases his innovative approach to substrate heating.

Latest Patents: Lippmaa's patent, titled "Device for vacuum processing," discloses a cutting-edge device that performs vapor-deposition on a substrate being heated within a vacuum chamber. Its design includes a light transmissible window in a section of the chamber, connected to a holding part for the substrate via a linear space. This setup is essential as it isolates the substrate from other chamber parts, allowing for efficient laser heating. A laser emitter positioned outside the window emits a laser beam through the linear space, providing superior heating without the drawbacks of conventional laser output reduction. This innovation represents a significant advancement in the field of material processing.

Career Highlights: Mikk Lippmaa is currently associated with the National Institute for Materials Science. Here, he leverages his expertise and innovative mindset to push the boundaries of material science research and development.

Collaborations: Throughout his career, Lippmaa has collaborated with esteemed colleagues such as Masatomo Sumiya and Tsuyoshi Ohnishi. These partnerships have fostered an environment of creativity and progress in the realm of materials innovation.

Conclusion: Mikk Lippmaa stands out as an influential inventor whose work in vacuum processing technology paves the way for future advancements in material science. His patented device not only enhances the efficiency of vapor-deposition processes but also exemplifies the spirit of innovation that drives progress in this field.