Mikio Totsuka

This inventor holds 16 USPTO granted patents, primarily in Photosensitive Materials. Top assignees: Fuji Photo Film Company, Limited, Nippon Paint Compnay, Ltd.. Active years: 1984-1998.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Mikio Totsuka. Retrieved from https://idiyas.com/inventor/mikio-totsuka

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

USPTO Granted Patents = 16

% Patents Active = 100.0

Average Co-Inventor Count = 3.6

ph-index = 7

Forward Citations = 176(Granted Patents)

Location History:

Fujinomiya, JP (1990)
Shizuoka, JP (1984 - 1998)

Company Filing History:

16 out of 16,458

Fuji Photo Film Company, Limited

patents

1 out of 827

Nippon Paint Compnay, Ltd.

patents

where one patent can have more than one assignee

Years Active: 1984-1998

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Areas of Expertise:

Photosensitive Composition

Image Forming Method

Aqueous Alkaline Developing Solution

Light-Sensitive Compound

Photosensitive Transfer Sheet

Microcapsule Positive Diazotype

Photopolymer Layer

Color Proofing Sheet

Silver Halide Sensor

Alkali Developable Photoresist

Imaging Transfer

Photosensitive Material

16 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 5738971 - Photosensitive composition for transfer sheets (1998-04-14),

2. 5731263 - Image forming method (1998-03-24),

3. 5563020 - Photosensitive transfer sheet (1996-10-08),

4. 5532116 - Aqueous alkaline developing solution (1996-07-02),

5. 5484682 - Light-sensitive bistrihalomethyl-s-triazine compound and (1996-01-16),

6. 5468594 - Image forming process (1995-11-21),

7. 5362874 - Light-sensitive bistrihalomethyl-s-triazine compounds (1994-11-08),

8. 5286597 - Photosensitive transfer material (1994-02-15),

9. 5002850 - Photosensitive material with alkali-in soluble barrier layer (1991-03-26),

10. 4980260 - Multi-color image-forming method with microcapsule positive diazotype (1990-12-25),

11. 4933258 - Use of photosensitive image receiving sheet material in imaging transfer (1990-06-12),

12. 4920036 - Photosensitive recording element having pigmented photopolymer layer (1990-04-24),

13. 4803145 - Light sensitive alkali developable photoresist material with fluorine (1989-02-07),

14. 4560637 - Silver halide sensor type polymerizable light-sensitive material (1985-12-24),

15. 4547450 - Silver halide sensor type polymerizable light-sensitive material (1985-10-15),

Title: Mikio Totsuka: Innovator in Photosensitive Technologies

Introduction

Mikio Totsuka is a prominent inventor based in Shizuoka, Japan. He has made significant contributions to the field of photosensitive compositions and image forming methods. With a total of 16 patents to his name, Totsuka's work has had a considerable impact on various industries.

Latest Patents

Among his latest patents is a photosensitive composition for transfer sheets. This composition comprises an organic polymer and a photo-polymerizable monomer, which has a specific formula involving an alkylene group and an alkyl group. Another notable patent is related to an image forming method that utilizes a heat-sensitive ink sheet. This method involves a heat-sensitive ink layer made from colored pigment and thermoplastic resin, allowing for advanced image formation using thermal heads or laser beams.

Career Highlights

Throughout his career, Totsuka has worked with notable companies such as Fuji Photo Film Company, Limited and Nippon Paint Company, Ltd. His experience in these organizations has allowed him to develop innovative technologies that enhance imaging processes.

Collaborations

Totsuka has collaborated with several talented individuals in his field, including Fumiaki Shinozaki and Tamotsu Suzuki. These collaborations have contributed to the advancement of his inventions and the overall progress in photosensitive technology.

Conclusion

Mikio Totsuka's contributions to the field of photosensitive technologies and image forming methods highlight his innovative spirit and dedication to advancing technology. His patents and collaborations reflect a commitment to excellence in his work.

Profile summary based on public USPTO records.

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]