The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 24, 1985
Filed:
Dec. 21, 1982
Fuji Photo Film Co., Ltd., Kanagawa, JP;
Abstract
A process for forming a polymeric image in a silver halide sensor type polymerizable light-sensitive material having a silver halide photographic emulsion layer is disclosed. The process is comprised of reducing a development nucleus-containing silver halide using at least one phenol compound and at least one hydrazine compound in the presence of at least one non-gaseous ethylenically unsaturated compound capable of undergoing addition polymerization to selectively polymerize the non-gaseous ethylenically unsaturated compound in an area where the development nucleus-containing silver halide is present. The phenol compound is represented by the following general formula (I): ##STR1## wherein R.sub.1, R.sub.2, R.sub.2 ', R.sub.3 and R.sub.3 ' are defined within the disclosure. The hydrazine compound is represented by the following general formula (II): ##STR2## wherein R.sub.4, R.sub.5 and R.sub.6 are defined within the disclosure. The process for forming a polymeric image exhibits a high sensitivity and provides a negative polymeric image with respect to the silver image. A silver halide sensor type polymerizable light-sensitive material suitable for use in the process is also disclosed.