Mike Murtagh

Title: Innovations by Mike Murtagh

Introduction

Mike Murtagh is an accomplished inventor based in Santa Clara, CA. He has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase his innovative approach to wafer processing and film deposition.

Latest Patents

One of his latest patents is titled "Apparatus and methods for real-time wafer chucking detection." This invention describes substrate supports and support assemblies that include a support surface with at least two electrodes and a plurality of purge channels bounded by a seal band. The design features a power supply connected to the electrodes configured as an electrostatic chuck. This allows for the measurement of the substrate's capacitance while on the substrate support to determine the chucking state of the substrate.

Another notable patent is "Geometrically selective deposition of dielectric films utilizing low frequency bias." This patent outlines apparatus and methods for depositing, treating, or etching a film. It describes a batch processing chamber that includes multiple processing regions, with at least one plasma processing region. A low frequency bias generator is connected to a susceptor assembly to intermittently apply a low frequency bias, enabling directional treatment or etching of the deposited film.

Career Highlights

Mike Murtagh is currently employed at Applied Materials, Inc., a leading company in the semiconductor manufacturing equipment industry. His work focuses on advancing technologies that enhance the efficiency and effectiveness of semiconductor fabrication processes.

Collaborations

Throughout his career, Mike has collaborated with notable professionals in the field, including Kenichi Ohno and Keiichi Tanaka. These collaborations have contributed to the development of innovative solutions in semiconductor technology.

Conclusion

Mike Murtagh's contributions to the field of semiconductor technology through his patents and work at Applied Materials, Inc. highlight his role as a significant innovator. His inventions continue to influence advancements in wafer processing and film deposition techniques.