The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 03, 2021
Filed:
Dec. 14, 2018
Applied Materials, Inc., Santa Clara, CA (US);
Kenichi Ohno, Sunnyvale, CA (US);
Keiichi Tanaka, San Jose, CA (US);
Li-Qun Xia, Cupertino, CA (US);
Tsutomu Tanaka, Santa Clara, CA (US);
Dmitry A. Dzilno, Sunnyvale, CA (US);
Mario D. Silvetti, Morgan Hill, CA (US);
John C. Forster, Mt. View, CA (US);
Rakesh Ramadas, Santa Clara, CA (US);
Mike Murtagh, Santa Clara, CA (US);
Alexander V. Garachtchenko, Mountain View, CA (US);
APPLIED MATERIALS, INC., Santa Clara, CA (US);
Abstract
Apparatus and methods for depositing and treating or etching a film are described. A batch processing chamber includes a plurality of processing regions with at least one plasma processing region. A low frequency bias generator is connected to a susceptor assembly to intermittently apply a low frequency bias to perform a directional treatment or etching the deposited film.