Mike D Kirk is a notable inventor based in Los Altos Hills, California. He has made significant contributions to the field of light scattering inspection systems, holding 2 patents that showcase his innovative approaches to technology.

Latest Patents

Kirk's latest patents include "Computer-implemented methods and systems for determining a configuration for a light scattering inspection system." This patent describes a method for creating a three-dimensional map of signal-to-noise ratio values for data acquired from a specimen. The method identifies portions of the scattering hemisphere where the signal-to-noise ratio is optimal, allowing for improved configurations of detection subsystems. Another patent focuses on "Systems for inspection of patterned or unpatterned wafers." This system features an illumination setup that collects scattered light and utilizes a segmented detector to preserve angular information, enabling the detection of defects on the specimen.

Career Highlights

Mike D Kirk is currently employed at KLA-Tencor Technologies Corporation, a leading company in the field of semiconductor inspection and metrology. His work at KLA-Tencor has allowed him to apply his innovative ideas in practical applications, contributing to advancements in the industry.

Collaborations

Kirk has collaborated with talented individuals such as Aleksey Petrenko and Amith Kumar Murali. These collaborations have likely fostered a creative environment that enhances the development of cutting-edge technologies.

Conclusion

Mike D Kirk's contributions to light scattering inspection systems reflect his dedication to innovation and technology. His patents and work at KLA-Tencor Technologies Corporation highlight his role as a significant figure in the field.