Company Filing History:
Years Active: 2022
Title: Miho Satou: Innovator in Sputtering Technology
Introduction
Miho Satou is a notable inventor based in Chigasaki, Japan. She has made significant contributions to the field of sputtering technology, particularly through her innovative patent that enhances sputtering efficiency.
Latest Patents
Miho Satou holds a patent for a sputtering target and method of producing the sputtering target. The objective of her invention is to provide a sputtering target with improved sputtering efficiency. The sputtering target is a cobalt target with a purity of 99.95 wt % or more. The invention specifies an intensity ratio of X-ray diffraction peaks corresponding to various planes of a hexagonal close-packed lattice structure along the sputtering surface, which is 0.85 or more.
Career Highlights
Miho Satou is currently employed at Ulvac, Inc., where she continues to develop and refine technologies related to sputtering. Her work has positioned her as a key figure in the advancement of materials used in various applications.
Collaborations
Some of her notable coworkers include Xiaoli Lu and Junichi Nitta, who contribute to the innovative environment at Ulvac, Inc.
Conclusion
Miho Satou's contributions to sputtering technology exemplify her commitment to innovation and efficiency in material science. Her patent reflects her expertise and dedication to advancing the field.