The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 23, 2022
Filed:
Mar. 28, 2019
Ulvac, Inc., Chigasaki, JP;
Xiaoli Lu, Chigasaki, JP;
Junichi Nitta, Chigasaki, JP;
Akira Nakamura, Chigasaki, JP;
Miho Satou, Chigasaki, JP;
Ulvac, Inc., Chigasaki, JP;
Abstract
[Object] To provide a sputtering target with further improved sputtering efficiency, and a method of producing the sputtering target. [Solving Means] In order to achieve the above-mentioned object, a sputtering target according to an embodiment of the present invention is a cobalt target having a sputtering surface and a purity of 99.95 wt % or more. An intensity ratio (I+I)/(I+I+I+I+I+I+I+I) of X-ray diffraction peaks corresponding to a (100) plane, a (002) plane, a (101) plane, a (102) plane, a (110) plane, a (103) plane, a (112) plane, and a (004) plane of a hexagonal close-packed lattice structure along the sputtering surface is 0.85 or more.