Company Filing History:
Years Active: 2017-2022
Title: Michiya Naito: Innovator in Photodegradable Resist Compositions
Introduction
Michiya Naito is a prominent inventor based in Chiba, Japan, known for his significant contributions to the field of photodegradable resist compositions. With a total of three patents to his name, Naito has made strides in enhancing the sensitivity and resolution of resist materials used in lithography.
Latest Patents
Naito's latest patents include a metal-containing onium salt compound that serves as a photodegradable base for resist compositions. This innovative compound exhibits excellent sensitivity to ionizing radiation, such as extreme ultraviolet (EUV), and improves resolution and focal depth in lithography. Additionally, it effectively reduces line width roughness (LWR) in fine patterns. Another notable patent involves a photosensitive compound that is particularly effective for resist compositions sensitive to short-wavelength light, including extreme ultraviolet and electron beam. This compound also enhances resolution and depth of focus while minimizing line edge roughness (LER) in fine patterns.
Career Highlights
Naito is currently employed at Toyo Gosei Co., Ltd., where he continues to develop advanced materials for the semiconductor industry. His work has been instrumental in pushing the boundaries of lithographic technology, making significant impacts on device manufacturing processes.
Collaborations
Naito collaborates with esteemed colleagues, including Masamichi Hayakawa and Yoshiyuki Utsumi, to further innovate in the field of resist compositions and photodegradable materials.
Conclusion
Michiya Naito's contributions to the development of photodegradable resist compositions highlight his role as a key innovator in the semiconductor industry. His patents reflect a commitment to advancing technology and improving manufacturing processes.