The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 29, 2021
Filed:
Dec. 20, 2017
Applicant:
Toyo Gosei Co., Ltd., Chiba, JP;
Inventors:
Assignee:
TOYO GOSEI CO., LTD., Chiba, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/039 (2006.01); G03F 7/20 (2006.01); C07C 395/00 (2006.01); C07F 11/00 (2006.01); C07C 309/12 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0045 (2013.01); C07C 309/12 (2013.01); C07C 395/00 (2013.01); C07F 11/00 (2013.01); G03F 7/004 (2013.01); G03F 7/039 (2013.01); G03F 7/20 (2013.01); G03F 7/2004 (2013.01); G03F 7/2059 (2013.01); C07C 2603/74 (2017.05); G03F 7/0048 (2013.01); Y02P 20/55 (2015.11);
Abstract
A photosensitive compound which can be suitably used for a resist composition having superior sensitivity with respect to light of short wavelength such as KrF and the like, especially to extreme ultraviolet or electron beam, superior resolution and depth of focus in lithography, and can suppress LER (line edge roughness) in fine pattern, a resist composition using the photosensitive compound, and a manufacturing method of a device is provided. A photosensitive compound including a divalent Te atom is provided.