Toyo Gosei Co., Ltd.

Michiya Naito

Masamichi Hayakawa

Yoshiyuki Utsumi

Takeshi Ikeya

Yuki Kawakami

A metal-containing onium salt compound suitable for use as a photodegradable base of a resist composition and a resist composition using the metal-containing onium salt compound are provided, the resist composition having excellent sensitivity to ionizing radiation such as extreme ultraviolet (EUV), excellent resolution and focal depth in lithography, and can reduce line width roughness (LWR) in a fine pattern. The onium salt compound including a specific metal is used as the photodegradable base.

Metal-containing onium salt compound, photodegradable base, resist composition, and method for manufacturing device using said resist composition

A photosensitive compound which can be suitably used for a resist composition having superior sensitivity with respect to light of short wavelength such as KrF and the like, especially to extreme ultraviolet or electron beam, superior resolution and depth of focus in lithography, and can suppress LER (line edge roughness) in fine pattern, a resist composition using the photosensitive compound, and a manufacturing method of a device is provided. A photosensitive compound including a divalent Te atom is provided.

Photosensitive compound, photoacid generator and resist composition containing the photosensitive compound, and method for manufacturing device using the resist composition

A method for manufacturing a polymer of which structure is exactly controlled is disclosed.

Growing community of inventors

Chiba, Japan

Michiya Naito