Singapore, Singapore

Michel Bosman

This inventor holds 2 USPTO granted patents. Top assignees: Agency for Science, Technology and Research, National University of Singapore. Active years: 2016-2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Michel Bosman. Retrieved from https://idiyas.com/inventor/michel-bosman-gxk5hr6w

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 5.5

ph-index = 1


Company Filing History:


Years Active: 2016-2024

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2 patents (USPTO):Explore Patents

Title: Michel Bosman: Innovator in Crystalline Silicon Technologies

Introduction

Michel Bosman is a notable inventor based in Singapore, recognized for his contributions to the field of crystalline silicon technologies. With a total of two patents to his name, he has made significant advancements in methods related to etching and plasmonic structures.

Latest Patents

One of his latest patents is titled "System and method for controlling directionality of fast-wet etching of crystalline silicon, c-Si." This document describes a system and method for selectively switching the fast-wet-etching direction of crystalline silicon nanostructures between the different crystallographic planes of c-Si by a simple method of sample agitation. This innovative method effectively allows the achievement of both anisotropic and isotropic wet-etching of c-Si. Another significant patent is "Process for creating lithographically-defined plasmonic structures with enhanced Q factors." This method provides a process for plasmonic structure manufacture and for protecting a plasmonic nanostructure during annealing. The method includes lithographically forming a plasmonic nanostructure on a substrate, encapsulating it in high-temperature resistant material, annealing the plasmonic nanostructure, and finally removing the high-temperature resistant material to reveal the annealed plasmonic nanostructure.

Career Highlights

Throughout his career, Michel Bosman has worked with esteemed organizations such as the Agency for Science, Technology and Research and the National University of Singapore. His work in these institutions has allowed him to develop and refine his innovative techniques in the field of crystalline silicon.

Collaborations

Michel has collaborated with notable colleagues, including Utkur Mirsaidov and Tanmay Ghosh, contributing to the advancement of research and innovation in his field.

Conclusion

Michel Bosman stands out as a significant figure in the realm of crystalline silicon technologies, with his patents reflecting his innovative spirit and dedication to advancing scientific knowledge. His contributions continue to influence the field and inspire future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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