Michael W Huang

Title: Michael W Huang: Innovator in Semiconductor Technology

Introduction

Michael W Huang is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His innovative approaches have advanced the methods used in the fabrication of semiconductor devices.

Latest Patents

One of his latest patents is titled "Method for forming a poly gate structure." This patent discloses a method that involves forming a dielectric layer on a substrate, followed by a polysilicon layer on the dielectric layer. A metal silicide layer is then formed on the polysilicon layer. After the complete formation of the metal silicide, an annealing process is conducted to induce phase transformation of the metal silicide layer. Subsequently, a passivation layer is created over the metal silicide layer, and a standard photolithography method is applied to form the primary structure of the poly gate. The method emphasizes that the metal silicide is annealed immediately after formation, preventing any phase transition during further treatments of the poly gate, thus fundamentally preventing surface extrusion of the poly gate.

Another notable patent is the "Seasoning process for etcher." This patent describes a seasoning process for an etcher that is performed before etching a dielectric layer to expose a metal silicide layer. The process includes a first plasma sputtering process followed by a second plasma sputtering process. A wafer containing the metal silicide layer is placed in the etcher with an etchant, and the first plasma sputtering process is executed. Several silicon wafers are then successively placed in the etcher to perform the second plasma sputtering process.

Career Highlights

Michael W Huang is currently employed at United Microelectronics Corporation, a leading company in the semiconductor industry. His work at this organization has allowed him to apply his innovative ideas and contribute to the advancement of semiconductor technologies.

Collaborations

Throughout his career, Michael has collaborated with notable colleagues, including Tri-Rung Yew and Chan-Lon Yang. These collaborations have further enriched his work and contributed to the development of cutting-edge technologies in the semiconductor field.

Conclusion

Michael W Huang is a distinguished inventor whose contributions to semiconductor technology have been significant. His innovative patents and work at United Microelectronics Corporation highlight his expertise and commitment to advancing the industry.