This inventor holds 1 USPTO granted patent. Top assignee: Carl Zeiss Smt Gmbh. Active years: 2014.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2014
Title: Michael Raum: Innovator in Microlithographic Exposure Technology
Introduction
Michael Raum is a notable inventor based in Oberkochen, Germany. He has made significant contributions to the field of microlithography, particularly through his innovative patent related to illumination systems.
Latest Patents
Michael Raum holds a patent for an "Illumination system for a microlithographic exposure apparatus." This invention features a condenser designed to transform a pupil plane into a field plane. The condenser includes a lens group with multiple consecutive lenses arranged to ensure that a light bundle focused by the condenser converges within each lens. Notably, at least one lens in the group has a concave surface. Additionally, the illumination system may incorporate a field stop objective that partially corrects any residual pupil aberration of the condenser.
Career Highlights
Michael Raum is associated with Carl Zeiss SMT GmbH, a leading company in optical and industrial metrology. His work at this esteemed organization has allowed him to push the boundaries of technology in microlithography.
Collaborations
Michael has collaborated with talented coworkers such as Gerhard Fuerter and Rafael Egger, contributing to advancements in their field.
Conclusion
Michael Raum's innovative work in microlithographic exposure technology exemplifies the impact of dedicated inventors in advancing optical systems. His contributions continue to influence the industry and inspire future innovations.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile