The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 28, 2014
Filed:
Apr. 26, 2006
Alexander Sohmer, Aalen, DE;
Aurelian Dodoc, Heidenheim, DE;
Heiko Feldmann, Aalen, DE;
Wilhelm Ulrich, Aalen, DE;
Gerhard Fuerter, Ellwangen, DE;
Rafael Egger, Munich, DE;
Artur Moegele, Oberkochen, DE;
Michael Raum, Oberkochen, DE;
Alexander Sohmer, Aalen, DE;
Aurelian Dodoc, Heidenheim, DE;
Heiko Feldmann, Aalen, DE;
Wilhelm Ulrich, Aalen, DE;
Gerhard Fuerter, Ellwangen, DE;
Rafael Egger, Munich, DE;
Artur Moegele, Oberkochen, DE;
Michael Raum, Oberkochen, DE;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
An illumination system of a microlithographic exposure apparatus comprises a condenser for transforming a pupil plane into a field plane. The condenser has a lens group that contains a plurality of consecutive lenses. These lenses are arranged such that a light bundle focused by the condenser on an on-axis field point converges within each lens of the lens group. At least one lens of the lens group has a concave surface. The illumination system may further comprise a field stop objective that at least partly corrects a residual pupil aberration of the condenser.