Oberkochen, Germany

Artur Moegele


Average Co-Inventor Count = 8.0

ph-index = 1


Company Filing History:


Years Active: 2014

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1 patent (USPTO):Explore Patents

Title: The Innovative Mind of Artur Moegele: Pioneering Illumination Technology

Introduction

Artur Moegele is a renowned inventor based in Oberkochen, Germany, recognized for his contribution to the field of microlithography. With a keen focus on enhancing precision in imaging systems, Moegele has demonstrated his innovative prowess through a significant patent in illumination systems.

Latest Patents

One of Artur Moegele's notable inventions is the patent for an illumination system designed for microlithographic exposure apparatuses. This system incorporates a condenser that transforms a pupil plane into a field plane. The innovative design features a lens group composed of multiple consecutive lenses, meticulously arranged to ensure that the light bundle focused by the condenser converges accurately within each lens. Notably, at least one lens in the group incorporates a concave surface, which enhances its performance. Additionally, this illumination system may include a field stop objective that partially corrects any residual pupil aberration from the condenser, making it a vital advancement in the field of optics.

Career Highlights

Artur Moegele is currently employed at Carl Zeiss SMT GmbH, a leading company in the field of optical technologies. His career at Carl Zeiss has allowed him to focus on advancing illumination technologies, contributing to the company's mission to enhance imaging capabilities across various applications.

Collaborations

Throughout his career, Moegele has collaborated with talented colleagues, including Alexander Sohmer and Aurelian Dodoc. These partnerships have provided a fertile ground for exchanging ideas and fostering innovation, further propelling advancements in the field of microlithography.

Conclusion

Artur Moegele stands out as a prominent figure in the realm of optics, with his inventive mind shaping the future of illumination systems for microlithographic exposure apparatuses. His groundbreaking patent reflects his commitment to innovation and collaboration within the industry, ultimately contributing to the continuous evolution of imaging technology.

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