This inventor holds 3 USPTO granted patents and 1 EPO patent. Top assignees: Mks Instruments, Inc., Eni Technology, Inc.. Active years: 2006-2020.
Location History:
- Rochester, NY (US) (2006)
- Livonia, NY (US) (2017)
- Hemlock, NY (US) (2020)
Company Filing History:
Years Active: 2006-2020
Title: Michael R Gilbert: Innovator in Sputtering Technology
Introduction
Michael R Gilbert is a notable inventor based in Hemlock, NY (US). He has made significant contributions to the field of sputtering technology, holding a total of 3 patents. His work focuses on improving sputtering systems, which are essential in various manufacturing processes.
Latest Patents
One of his latest patents is a sputtering system and method that includes an arc detection feature. This innovative sputtering system comprises a sputtering chamber with a target material acting as a cathode, along with an anode and a work piece. A direct current (DC) power supply provides the necessary electrical power to both the anode and cathode, generating plasma within the sputtering chamber. The system includes a detection module that monitors an electrical characteristic of the plasma to detect the occurrence of an arc. In one embodiment, the monitored characteristic is the impedance of the plasma, while in another, it is the conductance of the plasma.
Career Highlights
Throughout his career, Michael has worked with prominent companies such as MKS Instruments, Inc. and Eni Technology, Inc. His experience in these organizations has allowed him to refine his skills and contribute to advancements in sputtering technology.
Collaborations
Michael has collaborated with several professionals in his field, including David C Halstead and Jesse N Klein. These collaborations have further enriched his work and led to innovative solutions in sputtering systems.
Conclusion
Michael R Gilbert is a distinguished inventor whose work in sputtering technology has made a significant impact. His patents and collaborations reflect his commitment to innovation and excellence in the field.

