The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 04, 2017

Filed:

Jul. 17, 2008
Applicants:

Jesse N. Klein, West Henrietta, NY (US);

David C. Halstead, Rochester, NY (US);

Michael R. Gilbert, Livonia, NY (US);

Inventors:

Jesse N. Klein, West Henrietta, NY (US);

David C. Halstead, Rochester, NY (US);

Michael R. Gilbert, Livonia, NY (US);

Assignee:

MKS Instruments, Inc., Andover, MA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/34 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3444 (2013.01); H01J 37/32027 (2013.01); H01J 37/32935 (2013.01); H01J 37/32944 (2013.01); H01J 37/34 (2013.01); H01J 37/3476 (2013.01); H01J 2237/0206 (2013.01);
Abstract

A sputtering system that includes a sputtering chamber having a target material serving as a cathode, and an anode and a work piece. A direct current (DC) power supply supplies electrical power to the anode and the cathode sufficient to generate a plasma within the sputtering chamber. A detection module detects the occurrence of an arc in the sputtering chamber by monitoring an electrical characteristic of the plasma. In one embodiment the electrical characteristic monitored is the impedance of the plasma. In another embodiment the electrical characteristic is the conductance of the plasma.


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