Location History:
- Rochester, NY (US) (2006 - 2017)
- Cuba, NY (US) (2020)
Company Filing History:
Years Active: 2006-2020
Title: David C Halstead: Innovator in Sputtering Technology
Introduction
David C Halstead is a notable inventor based in Rochester, NY (US). He has made significant contributions to the field of sputtering technology, holding a total of 3 patents. His work focuses on improving sputtering systems, which are essential in various manufacturing processes.
Latest Patents
One of Halstead's latest patents is a sputtering system and method that includes an arc detection mechanism. This innovative sputtering system features a sputtering chamber with a target material acting as a cathode, along with an anode and a work piece. A direct current (DC) power supply provides the necessary electrical power to both the anode and cathode, generating plasma within the sputtering chamber. The system includes a detection module that monitors an electrical characteristic of the plasma to detect the occurrence of an arc. In one embodiment, the monitored characteristic is the impedance of the plasma, while in another, it is the conductance of the plasma.
Career Highlights
Throughout his career, David C Halstead has worked with prominent companies such as MKS Instruments, Inc. and Eni Technology, Inc. His experience in these organizations has contributed to his expertise in sputtering technology and innovation.
Collaborations
Halstead has collaborated with notable individuals in his field, including Michael R Gilbert and Jesse N Klein. These collaborations have likely enhanced his work and contributed to the development of his patents.
Conclusion
David C Halstead is a distinguished inventor whose work in sputtering technology has led to valuable innovations. His patents reflect his commitment to advancing the field and improving manufacturing processes.