IDiyas

For the Inventor, By the Inventor

Burlington, VT, United States of America

Michael L Kerbaugh

USPTO Granted Patents = 8

Average Co-Inventor Count = 5.0

ph-index = 7

Forward Citations = 554(Granted Patents)


Location History:

  • Burlington, VT (US) (1988 - 1994)
  • Jericho, VT (US) (1995)

Company Filing History:

goldMedal8 out of 164,108 
 
International Business Machines Corporation
 patents

Years Active: 1988-1995

Loading Chart...
8 patents (USPTO):
1. 5466636 - Method of forming borderless contacts using a removable mandrel (1995-11-14),
2. 5298790 - Reactive ion etching buffer mask (1994-03-29),
3. 5173439 - Forming wide dielectric-filled isolation trenches in semi-conductors (1992-12-22),
4. 5118384 - Reactive ion etching buffer mask (1992-06-02),
5. 4978594 - Fluorine-containing base layer for multi-layer resist processes (1990-12-18),
6. 4838991 - Process for defining organic sidewall structures (1989-06-13),
7. 4799990 - Method of self-aligning a trench isolation structure to an implanted (1989-01-24),
8. 4776922 - Formation of variable-width sidewall structures (1988-10-11),

I specialize in innovations, inventions, inventors, patent attorneys, assignees, and patents. Let me provide you with an article focusing on inventor Michael L Kerbaugh's remarkable contributions to the field of technology and innovation.

Title: The Pioneering Spirit of Michael L Kerbaugh: A Driving Force in Technological Advancements

Introduction:

Michael L Kerbaugh, hailing from Burlington, VT, is celebrated for his unwavering dedication to innovation and his relentless pursuit of technological advancements. With a portfolio of 8 patents under his name, he stands as a beacon of inspiration for aspiring inventors worldwide.

Latest Patents:

Among his recent patents is the groundbreaking "Method of forming borderless contacts using a removable mandrel." This seminal semiconductor fabrication technique revolutionizes the formation of borderless contacts, enhancing efficiency and precision in the manufacturing process. Additionally, his "Reactive ion etching buffer mask" patent showcases his ingenuity in developing an improved mask for trench formation in substrates, pushing the boundaries of traditional etching methodologies.

Career Highlights:

Michael L Kerbaugh's illustrious career is intertwined with his tenure at International Business Machines Corporation (IBM). His innovative spirit has significantly impacted the company's technological advancements, establishing him as a key figure in driving progress within the organization.

Collaborations:

Throughout his career, Michael L Kerbaugh has collaborated closely with esteemed colleagues such as John F Rembetski and Donald M Kenney. Their combined expertise and dedication to pushing technological boundaries have led to the successful development of cutting-edge solutions in the field of semiconductor fabrication.

Conclusion:

In conclusion, Michael L Kerbaugh's passion for innovation and his relentless pursuit of excellence have solidified his position as a standout figure in the world of inventors. His legacy continues to inspire future generations to push the limits of technology, paving the way for a brighter and more innovative future.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…