This inventor holds 3 USPTO granted patents. Top assignees: Conexant Systems, Inc., Newport Fab, LLC. Active years: 2001-2004.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2001-2004
Title: Michael J Berg: Innovator in Plasma Etching Technology
Introduction
Michael J Berg is a notable inventor based in Mechanicsville, VA (US). He has made significant contributions to the field of semiconductor fabrication, particularly in plasma etching technology. With a total of 3 patents to his name, Berg's work has advanced the methods used in the manufacturing of electronic components.
Latest Patents
Berg's latest patents include a "Method and apparatus for high-resolution in-situ plasma etching of inorganic and metals films." This innovative method allows for the plasma etching of both metal and inorganic dielectric layers within a single chamber during deep sub-micron semiconductor fabrication. The process utilizes fluorine-based chemistries, or a mixture of fluorine and chlorine-based chemistries, to etch the inorganic dielectric layer. A switch to chlorine-based chemistries is then made within the same etching chamber to etch the metal layer. Additionally, overetching may be performed with chlorine-based chemistries to clear any residuals.
Another patent by Berg is titled "Apparatus for high-resolution in-situ plasma etching of inorganic and metal films." This patent shares similar methodologies and applications as his previous work, emphasizing the efficiency and effectiveness of his techniques in semiconductor manufacturing.
Career Highlights
Throughout his career, Michael J Berg has worked with prominent companies in the technology sector. He has been associated with Conexant Systems, Inc. and Newport Fab, LLC, where he has contributed his expertise in semiconductor fabrication and plasma etching technologies.
Collaborations
Berg has collaborated with notable professionals in his field, including Shao-Wen Hsia and Maureen R Brongo. These collaborations have further enriched his work and contributed to advancements in plasma etching technology.
Conclusion
Michael J Berg's innovative contributions to plasma etching technology have significantly impacted the semiconductor industry. His patents reflect a deep understanding of the complexities involved in semiconductor fabrication, showcasing his role as a leading inventor in this field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
