This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Carl Zeiss Smt Gmbh. Active years: 2017.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2017
Title: Michael Gleeson: Innovator in Reflective Optical Elements
Introduction
Michael Gleeson is a notable inventor based in Leiderdorp, Netherlands. He has made significant contributions to the field of optical engineering, particularly in the development of reflective optical elements for extreme ultraviolet (EUV) lithography. His innovative methods address critical challenges in the production of these optical components.
Latest Patents
Gleeson's most recent patent is titled "Method for producing a reflective optical element for EUV-lithography." This patent focuses on alleviating issues such as blistering, cracking, and chipping in the topmost layers of a multilayer system exposed to reactive hydrogen. The method involves applying a multilayer system composed of 30-60 stacks to a substrate, where each stack consists of layers made from high and low refractive index materials. The thickness ratio of these layers is carefully controlled to optimize reflectivity at wavelengths between 5 nm and 20 nm. This innovative approach enhances the durability and performance of reflective optical elements.
Career Highlights
Michael Gleeson is currently employed at Carl Zeiss SMT GmbH, a leading company in the field of optical systems. His work at this prestigious organization has allowed him to push the boundaries of optical technology and contribute to advancements in lithography.
Collaborations
Throughout his career, Gleeson has collaborated with talented professionals in the field, including Alexey Kuznetzov and Robbert W. E. Van De Kruijs. These collaborations have fostered a creative environment that encourages innovation and the sharing of ideas.
Conclusion
Michael Gleeson is a prominent figure in the realm of optical engineering, with a focus on enhancing the production of reflective optical elements. His contributions through patents and collaborations continue to shape the future of EUV lithography.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
