Company Filing History:
Years Active: 2005-2010
Title: Michael Friedemann: Innovator in Metallization Technologies
Introduction
Michael Friedemann is a notable inventor based in Dresden, Germany. He has made significant contributions to the field of metallization technologies, particularly in the semiconductor industry. With a total of 4 patents to his name, Friedemann's work has advanced the efficiency and reliability of metallization processes.
Latest Patents
Friedemann's latest patents include innovative methods that enhance the formation of conductive layers in semiconductor devices. One of his patents describes a method of forming a copper-based metallization layer that includes a conductive cap layer by an advanced integration regime. This method involves designing a series of deposition steps and intermediate sputter processes to efficiently integrate conductive cap layers into established process sequences. Another significant patent outlines a method for forming a conductive barrier layer within critical openings through a final deposition step after a re-sputter deposition. This approach allows for the creation of a thin conductive layer in interconnect structures, improving reliability and reducing the need for extensive process control.
Career Highlights
Michael Friedemann is currently employed at Advanced Micro Devices Corporation, where he continues to innovate in the field of semiconductor manufacturing. His work has been instrumental in developing processes that enhance the performance and reliability of electronic devices.
Collaborations
Friedemann has collaborated with notable colleagues, including Volker Kahlert and Axel Preusse, contributing to a dynamic team focused on advancing metallization technologies.
Conclusion
Michael Friedemann's contributions to the field of metallization technologies have established him as a key inventor in the semiconductor industry. His innovative methods and collaborative efforts continue to shape the future of electronic manufacturing.