Company Filing History:
Years Active: 2018-2025
Title: Michael F Vollero: Innovator in Plasma Technology
Introduction
Michael F Vollero is a notable inventor based in Manlius, NY (US), recognized for his contributions to the field of plasma technology. With a total of five patents to his name, Vollero has made significant advancements in the detection of process contaminants and plasma generation.
Latest Patents
Vollero's latest patents include a "Partial pressure gauge assembly for process contaminant detection using photoionization and associated method." This innovative photoionization sensor assembly features a housing that defines a chamber permeable to analyte and non-analyte gases. It utilizes a radiation source to emit photons that ionize the analyte gas while remaining insufficient to ionize non-analyte gases. The assembly includes electrodes that collect photoelectrons, allowing for precise measurements of total pressure and electrical current due to ionization.
Another significant patent is the "HTCC antenna for generation of microplasma." This device is designed to generate plasma and comprises a support made of a ceramic matrix with an embedded split-ring conductor. The design ensures that the plasma is generated in proximity to one side of the support while isolating the other side from the plasma and gases within the chamber.
Career Highlights
Vollero is currently employed at Inficon GmbH, where he continues to innovate in the field of plasma technology. His work has contributed to advancements that enhance the efficiency and accuracy of contaminant detection and plasma generation.
Collaborations
Throughout his career, Vollero has collaborated with notable colleagues, including Shawn M Briglin and John Gordon Wiley. These collaborations have fostered an environment of innovation and have led to the development of cutting-edge technologies in their respective fields.
Conclusion
Michael F Vollero stands out as a prominent inventor whose work in plasma technology has made a significant impact. His patents reflect a commitment to advancing the understanding and application of photoionization and plasma generation.
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